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US Patent Issued to HITACHI HIGH-TECH on Oct. 20 for "Electron gun and electron microscope" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,820, issued on Oct. 20, was assigned to HITACHI HIGH-TECH Corp. (Tokyo). "Electron gun and electron microscope" was invented by Hideo Moris... Read More


US Patent Issued to NuFlare Technology, NuFlare Technology America on Oct. 20 for "Charged particle beam writing apparatus and charged particle beam writing method" (Japanese, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,821, issued on Oct. 20, was assigned to NuFlare Technology Inc. (Yokohama, Japan) and NuFlare Technology America Inc. (Sunnyvale, Calif.). ... Read More


US Patent Issued to FEI on Oct. 20 for "Aberration correction in charged particle spectroscopy" (Dutch Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,822, issued on Oct. 20, was assigned to FEI Co. "Aberration correction in charged particle spectroscopy" was invented by Alexander Henstra ... Read More


US Patent Issued to Carl Zeiss Microscopy on Oct. 20 for "Ablating material for an object in a particle beam device" (German Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,823, issued on Oct. 20, was assigned to Carl Zeiss Microscopy GmbH (Jena, Germany). "Ablating material for an object in a particle beam dev... Read More


US Patent Issued to Axcelis Technologies on Oct. 20 for "Tuning apparatus for minimum divergence ion beam" (Massachusetts Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,824, issued on Oct. 20, was assigned to Axcelis Technologies Inc. (Beverly, Mass.). "Tuning apparatus for minimum divergence ion beam" was ... Read More


US Patent Issued to Tokyo Electron on Oct. 20 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,825, issued on Oct. 20, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Yasuaki Taniike (Nirasak... Read More


US Patent Issued to Tokyo Electron on Oct. 20 for "Plasma control method, plasma processing apparatus and plasma processing system" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,826, issued on Oct. 20, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma control method, plasma processing apparatus and plasma process... Read More


US Patent Issued to KOREA INSTITUTE OF FUSION ENERGY on Oct. 20 for "Electrode for capacitively coupled plasma generating device, capacitively coupled plasma generating device comprising same, and capacitively coupled plasma uniformity adjusting method" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,827, issued on Oct. 20, was assigned to KOREA INSTITUTE OF FUSION ENERGY (Daejeon, South Korea). "Electrode for capacitively coupled plasma... Read More


US Patent Issued to Applied Materials on Oct. 20 for "Multi-electrode source assembly for plasma processing" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,828, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Multi-electrode source assembly for plasma processin... Read More


US Patent Issued to Lam Research on Oct. 20 for "Systems and methods for extracting process control information from radiofrequency supply system of plasma processing system" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,829, issued on Oct. 20, was assigned to Lam Research Corp. (Fremont, Calif.). "Systems and methods for extracting process control informati... Read More